Pall Authorized Reseller Malaysia
SVAF is the authorized reseller for Pall Products in Malaysia, providing local customers with stocked inventory, technical consultation, and on-site support. SVAF ensures fast, reliable access to Pall’s products while delivering responsive service and expertise across multiple high-tech industries.
Pall Corporation is a proven partner providing filtration, separation and purification solutions to meet the demanding needs of customers around the globe. Pall offers a wide range of filter to meet your fluid management needs.
Browse by category to quickly find the Pall filtration solution that meets your needs:
Semiconductors
Providing filtration, purification and separations solutions for a broad range of fluids, such as chemicals, gas, water, CMP slurries and photoresist.
Chemicals
Contamination control is one of the most critical concerns in the manufacture of semiconductor devices. Pall Corporation provides filtration, purification and separations solutions for a broad range of fluids, such as chemicals, gas, water, CMP slurries and photoresist.
LEARN MORE
CMP
Pall’s CMP filters effectively remove large slurry particles and maintain desired slurry formulation and chemistry. With the option of tailoring to ILD, STI, Tungsten, Bulk Copper, Barrier Copper, and other slurries, implementing Pall filters leads to a reduction in micro-scratches, arc scratches, chatter marks and process instability.
LEARN MORE
Lithography
Pall Lithography filters use a variety of proprietary membrane materials to minimize particles, metallic contributions, gels, and microbubbles. An optimized filter design reduces chemical usage during start-up and minimizes defects on the wafer surface for increased yields.
LEARN MORE
Process Gas Filtration
Pall’s process gas filters provide effective removal of particles through superior filtration technology. Benefits include high particle removal efficiency, high flow rates with / low differential pressure, and low outgassing. In addition, our all-metal filters are highly transparent to molecular contamination.
LEARN MORE
Process Gas Purification
A method to eliminate and minimize harmful molecular contaminants is essential in areas where traditional particle filtration is ineffective. Pall’s high capacity purification systems provide highly efficiency molecular impurity removal with a long service life, translating to low cost of ownership.
LEARN MORE
Ultrapure Water
Pall Ultrapure Water Filtration products remove colloidal contaminants such as silica, bacterial breakdown products.. The filters and purifiers efficiently eliminate contaminants at parts of the UPW system to mitigate the harmful effects of metal ionic and particulate contamination.
LEARN MORE
Wet Etch and Cleans
Ultipleat® SP DR Filters provide advanced 2 nanometer retention in critical surface preparation chemical baths such as HF and BOE. The patented asymmetric pore design, developed using Pall’s proprietary membrane modeling technology, reduces flow resistance and provides longer service life.
LEARN MORE
Data Storage
We are ready to meet your needs with our advanced membrane and purification technologies.
CMP
CMP Filters maintain slurry chemistry and control particle size. Pall CMP filters provide users with effective removal of contaminants and can be tailored to fit a data storage manufacturer’s specific process chemistries.
LEARN MORE
Plating
Pall’s Plating Filters keep process and plating rates stable and help reduce plating defects. Pall offers a variety of membrane options which provide excellent removal retention for the nickel plating process. Pall filtration systems reduce contaminants that cause defects on nickel plated substrates.
LEARN MORE
Web etch and Cleans
Advanced Wet Etch Clean Filters provide improved bath cleanliness, by providing sub-micron filtration at very low pressure drops, thereby achieving high levels of particle retention without sacrificing flow rate. They are customizable and work to prevent particulate from reaching the hard disk’s surface. Wet Etch Clean filters aggressively eliminate particulate in chemical and D.I. Water baths that can cause defects in hard disk media..
LEARN MORE
Display Applications
Ask us how we can help you improve your plating, slurry, cleaning fluid (UPW, IPA) and lubing processes.
CDA
In the complex display industry, CDA is used in a wide variety of processes and is essential to the efficiency of pneumatic systems. Particle contamination can rapidly accelerate wear on pneumatic systems and clog valves leading to increased downtime and operating costs.
LEARN MORE
Cleaning
Pall Display Cleaning Systems eliminate the impurities and contaminants that lead to process excursions such as chemical reactions, surface defects, and ineffective cleaning. Pall offers an extensive list of chemically compatible filters for aggressive process chemicals (ozone water, HF, photo resists) with high flow and industry leading particle removal efficiency.
LEARN MORE
Color Filter
Trapped particles, contaminants, bubbles and gels can cause non-uniformity to the surface of an LCD color filter. Control of harmful impurities is required to maintain depth uniformity, eliminate the chance of pinholes, and maximize general product quality.
LEARN MORE
Gas filtration and purification
Pall’s Process Gas Filtration and Purification systems effectively remove particles and molecular impurities using industry leading technologies. These systems are engineered to decrease particles and impurities that reduce product yields from adding defects to critical display processes.
LEARN MORE
Lithography
Pall lithography filters use a variety of proprietary membrane materials to minimize metallic contributions, gels and microbubble formations. An optimized filter design reduces chemical usage during start-up and minimizes defects on the wafer surface.
LEARN MORE
ODF
Pall’s ODF Filtration Systems block and eradicate defect causing gelatinous particles and contaminants from liquid crystal (LC) material to reduce surface defects. Defects are reduced on critical LC surfaces by filters engineered for low pressure configurations and eliminate the presence of air bubbles, which cause defects during the liquid crystal one drop filling (ODF) process.
LEARN MORE
Organic materials and printing
Quality ink jet filtration needs to be optimized in order to achieve correct pigmentation and output repeatability while keeping costs at a minimum. Surface defects on the organic films and other problems caused by contaminants can be significantly reduced by implementation of Pall filtration systems. Pall offers cost-effective solutions to meet the needs of the OLED film manufacturer and is designed for high volume use with a small footprint.
LEARN MORE
Web etch chemicals
Pall Wet Etch Clean filters eliminate impurities and contaminants in high flow rate applications that lead to process excursions such as chemical reactions, surface defects, and ineffective cleaning resulting in lower display quality.
LEARN MORE
Graphic Arts
We offer a wide array of inkjet filtration technologies that can remove hard particles, gels, and bubbles that can foul print heads and reduce image quality and overall print costs.
Ink Degas
Foreign gases can enter ink throughout the printing and manufacturing process. These dissolved gases and microbubbles generate misfires of inkjet nozzles and will threaten print quality and repeatability, if they are not eliminated using proper degassing modules.
LEARN MORE
Ink Formula Filtration
Quality ink jet filtration needs to be optimized in order to achieve correct dispersion characteristics and image repeatability. Image defects caused by contaminants can be significantly reduced by implementation of Pall filtration systems. Pall offers cost-effective solutions to meet the needs of the ink jet ink formulator as well as the ink jet printer manufacturer.
LEARN MORE
On Board Printer Filtration
Point of use filtration on ink jet printers is essential to achieve superior image quality and optimize printer uptime. Find out more about our filtration solutions for first-class images, every time.
LEARN MORE
Photovoltaics (Solar)
Contributing to the rapid growth of manufacturing of solar cells by maximizing productivity and profitability while minimizing problems.
Process Gas Filtration
Process gas filters provide effective removal of particles utilizing industry leading filtration technology. The key features of the Gaskleen filters include high particle removal efficiency as well as high flow rates with low differential pressure.
LEARN MORE
Process Gas Purification
Pall’s Process Gas Purification Systems eliminate and minimize harmful molecular contaminants that cause defects on the PV substrate. Molecular impurities in the process gases such as siloxanes and moisture can lead to process inconsistencies, ultimately leading to wafer level defects and reduced product yield.
LEARN MORE
Waste Reclaim
Proper wastewater management has always been vital to low cost silicon ingot manufacturing. As wastewater accumulates it contaminates equipment and machines by fouling components and leads to uncontrolled sedimentation in pipes, tanks and sinks. This silicon build-up necessitates the use of more and more filters to control the high silicon particle levels, leading to increased waste disposal costs and an increased threat of decreased performance of cutting/grinding equipment.
LEARN MORE
Wet etch and Cleans
Pall Wet Etch Clean filters eliminate impurities and contaminants on the PV wafer surface that lead to process excursions such as chemical reactions, surface defects, and ineffective cleaning resulting in lower product quality.
LEARN MORE
